Antireflective Coating and Passivation
Silicon nitride films produced by plasma-enhanced chemical vapor deposition provide a low reflectance coating and a front surface and bulk passivation for silicon cells. Filtration and purification of gas precursors such as silane and ammonia removes any contaminants affecting uniform coating thickness and surface passivation. Within these deposition tools, your require wafer carriers designed to ensure thermal and electrical resistance uniformity across the plates and the wafers while in the process chamber for optimized plasma-enhanced deposition.
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For over 20 years, POCO® graphites have provided uniform microstructure for uniform heating and strength during batch PECVD processing.
To reduce particle deposition on substrates, Entegris offers gas filtration for a wide range of applications including process gas filtration and bulk supply.